9783527325443

Clearly structured in five major sections on applications, this monograph covers such hot technologies as nanotechnology, solar cell technology, biomedical and clinical applications, and sustainability. Since the topic, applications and readers are highly interdisciplinary, the book bridges materials science, industrial chemistry, physics, and engineering -- making it a must-have for researchers in industry and academia, as well as those working in application-oriented plasma technology.

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Hideo Ikegami is Professor Emeritus of both Nagoya University and National Institute for Fusion Science in Nagoya, Japan. His primary interest is basic plasma physics and various plasma applications. In 1996, he created a consulting company of plasma application technology, Technowave Inc., and served as president. He is one of the editors of Advanced Plasma Technology (Wiley-VCH, 2007).

Noriyoshi Sato has worked in research and education on plasma physics and is now Professor Emeritus at Tohoku University, Japan. His primary interest is basic plasma behaviour related to various plasma applications. He is elevating his works in collaboration with companies. He is one of the editors of Advanced Plasma Technology (Wiley-VCH, 2007).

Akihisa Matsuda is Special Guest Professor at the Graduate School of Engineering Science of Osaka Univeristy, Japan, since 2007, after being Director of Research Initiative for Thin Film Silicon Solar Cells at the National Institute of Advanced Industrial Science and Technology (AIST), Japan. His main field of interest are plasma-process diagnostics and process control for thin film silicon solar cells.

Kiichiro Uchino is currently Professor at the Department of Applied Science for Electronics and Materials at Kyushu University in Fukuoka, Japan. He is working on laser-aided diagnostics of plasmas and various industrial plasma applications.

Masayuki Kuzuya is currently the Dean of College of Pharmaceutical Sciences, and Professor of Pharmaceutical Physical Chemistry at Matsuyama University, Japan. His research interest is in the field of fundamental studies of organic plasma chemistry and its bio- and pharmaceutical applications.

Akira Mizuno is Professor of the Department of Ecological Engineering at Toyohashi University of Technology. His research includes applied electrostatics and high-voltage engineering, which includes electrostatic precipitation, environmental application of plasma, sterilization and other environmental friendly technologies as well as manipulation and measurement of single DNA molecules. He is editor of the International Journal of Plasma Environmental Science and Technology.

Yoshinobu Kawai works as Research Professor at Interdisciplinary Graduate School of Engineering Sciences at Kyushu University, Japan, since 1974. He is expert in production of large diameter plasma in the frequency range from VHF to microwave for amorphous and microcrystalline silicon solar cell and etching. He is one of the editors of Advanced Plasma Technology (Wiley-VCH, 2007).

Environmental Technologies
Atmospheric Plasma Air Pollution Control, Water and Waste Treatment Technology
Non-Thermal Plasma Process-VOCs Decomposition and its Optical Analysis
Laser Investigations of Flow Patterns in Electrostatic Precipitators and Non-Thermal Plasma Reactors
Thermal and Non-Thermal Plasma for Environmental Applications
Non-Thermal Plasma Based Hybrid Methods for Exhaust Gas Treatment
Chemistry of Organic Pollutants in Atmospheric Plasmas
Generation and Application of Wide Area Plasma
Applications In Life Sciences And Medicine
Plasma-Enhanced Synthesis of Nano Particles: Biotech Applications
Applications of Pulsed Power and Plasmas to Biosystems and Living Organisms
Rewritable Bioarrays
Plasma Polymerisation in Enabaling the Convergence of Technologies
Antibacterial Effect of Short-Pulse Discharge
Pulsed Plasma Surface Modifications for Drug Delivery and Other Biomaterials Applications
Novel Drug Engineering by Plasma Techniques
Disinfection of Chronic Wounds with Atmospheric Plasma
Solar Cells
Plasma Processing for Thin Film Silicon Solar Cells
Large Area Deposition for Amorphous and Microcrystalline Silicon
Diagnostics and Modeling of SiH4/H2 plasmas for the Deposition of Microcrystalline Silicon
Relationship Between Photo-Induced Stability and Inclusion of Nanoparticles in alpha-Si:H
Characteristics of VHF Plasma with Large Area
Diamond Like Carbon Films
DLC Films
Magnetron Sputtering of Fullerene-Like Carbon Nitride and Phosphorous Carbide Thin Solid Films
Apllications of DLCs to Bio-Processing
Plasma Processing of Nano-Crystalline Semiconductive cBN Thin Films
Tribology of Plasma-Deposited Diamond-Like Carbon Films
DLC Thin Films Grown in Plused Plasmas
Basic And Novel Approaches
Novel Electromagnetic and Reactive Media from Microplasmas
Growth Control of Amorphous Nanoparticles in Low Pressure Cold Plasma
Crystallized Nanodust Particle Growth, Dynamics and Transport in Low Pressure Cold Plasmas
Systematic Transport and Manipulation of Fine Particles by Low Frequency;
Traveling Plasma Modulations
Collection and Removal of Fine Particles in Plasma Chambers
Table of Contents provided by Publisher. All Rights Reserved.

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Industrial Plasma Technology Applications from Environmental to Energy Technologies

Industrial Plasma Technology Applications from Environmental to Energy Technologies

3527325441

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